Reactive NanoTechnologies, Inc.
180 Lake Front Drive
Hunt Valley, MD 21030
Phone: 410-771-9801
Fax: 410-771-0586

Bonding of Sputter Targets - Peformance Data

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Performance Data

Significant testing, both laboratory and live application, has been performed to support the benefits of NanoBond® in the most rigorous applications. Summary of sputtering trials (all targets bonded to Cu backing plate).

Target
Material
Bond
Type
Power
Mode
Cooling
Bond
Area
Max. Power without
Failure (W)
Power
Density
(W/cm2)
Indium Tin Oxide
InSn-Revlow
DC
Indirect
3” Diameter
200
4.4
Indium Tin Oxide
Elastomer
DC
Indirect
3” Diameter
300
6.6
Indium Tin Oxide
In Reflow
DC
Indirect
3” Diameter
335
7.3
Indium Tin Oxide
NanoBond®
DC
Indirect
3” Diameter
460
10.1
Alumina
Elastomer
RF
Indirect
3” Diameter
300
6.6
Alumina
NanoBond®
RF
Indirect
3” Diameter
400*
8.8*
Quartz
NanoBond®
RF
Indirect
3” Diameter
400*
8.8*
TiC
NanoBond®
DC
Indirect
3” Diameter
400
8.8
Boron Carbide
In Reflow
DC
Indirect
25” x 6”
2000
2
Boron Carbide
NanoBond®
DC
Indirect
25” x 6”
4000*
4*

Residual Stress Calculations

FEA modeling of conventional and NanoBond® joints. The deflection and residual stress are an order of magnitude lower with NanoBond®.

Nanobond stress graph
NanoBond® Maximum deflection - 0.04mm over 150mm


Conventional Bond Maximum deflection - 0.7mm over 150mm

The temperature profile during NanoBond® joining at the moment of solder solidification is shown here.